Nanoscaled Surface Patterning of Conducting Polymers
Identifieur interne : 002539 ( Main/Exploration ); précédent : 002538; suivant : 002540Nanoscaled Surface Patterning of Conducting Polymers
Auteurs : Lin Jiang [Allemagne, Singapour] ; Xing Wang [Allemagne] ; Lifeng Chi [Allemagne]Source :
- Small [ 1613-6810 ] ; 2011-05-23.
Abstract
In continuing the steady development of integrated‐circuit‐related fabrication, the ability to pattern conducting polymers into smaller and smaller sizes in order to realize devices with enhanced performance or even wholly new properties begins to take a more prominent role in their advanced applications. This review summarizes the recent advances in top‐down and bottom‐up patterning of conducting polymers on surfaces with different approaches including direct writing, in‐situ synthesis or assembly, etching, and nanoscratching. All of the latest emerging strategies have the potential to go beyond the current state of the art towards real progress in terms of high‐precision positioning, high resolution, high throughout, higher stability, facile processing, and lower‐cost production.
Recent advances in top‐down and bottom‐up patterning of conducting polymers on surfaces using ‘add‐on’ processes such as direct writing, in‐situ syntheses or assemblies, and ‘subtract‐from’ processes such as etching and nanoscratching are summarised. These processes make possible high‐precision positioning, high resolution, and considerable throughout. The most promising applications of the patterned conducting polymer devices with enhanced performance and new properties are also introduced.
Url:
DOI: 10.1002/smll.201002356
Affiliations:
Links toward previous steps (curation, corpus...)
- to stream Istex, to step Corpus: 001491
- to stream Istex, to step Curation: 001491
- to stream Istex, to step Checkpoint: 000468
- to stream Main, to step Merge: 002564
- to stream Main, to step Curation: 002539
Le document en format XML
<record><TEI wicri:istexFullTextTei="biblStruct"><teiHeader><fileDesc><titleStmt><title xml:lang="en">Nanoscaled Surface Patterning of Conducting Polymers</title><author><name sortKey="Jiang, Lin" sort="Jiang, Lin" uniqKey="Jiang L" first="Lin" last="Jiang">Lin Jiang</name></author><author><name sortKey="Wang, Xing" sort="Wang, Xing" uniqKey="Wang X" first="Xing" last="Wang">Xing Wang</name></author><author><name sortKey="Chi, Lifeng" sort="Chi, Lifeng" uniqKey="Chi L" first="Lifeng" last="Chi">Lifeng Chi</name></author></titleStmt><publicationStmt><idno type="wicri:source">ISTEX</idno><idno type="RBID">ISTEX:CDE8BED65384518E846832DD45123D332E048E34</idno><date when="2011" year="2011">2011</date><idno type="doi">10.1002/smll.201002356</idno><idno type="url">https://api.istex.fr/ark:/67375/WNG-WFR7NJ1J-C/fulltext.pdf</idno><idno type="wicri:Area/Istex/Corpus">001491</idno><idno type="wicri:explorRef" wicri:stream="Istex" wicri:step="Corpus" wicri:corpus="ISTEX">001491</idno><idno type="wicri:Area/Istex/Curation">001491</idno><idno type="wicri:Area/Istex/Checkpoint">000468</idno><idno type="wicri:explorRef" wicri:stream="Istex" wicri:step="Checkpoint">000468</idno><idno type="wicri:doubleKey">1613-6810:2011:Jiang L:nanoscaled:surface:patterning</idno><idno type="wicri:Area/Main/Merge">002564</idno><idno type="wicri:Area/Main/Curation">002539</idno><idno type="wicri:Area/Main/Exploration">002539</idno></publicationStmt><sourceDesc><biblStruct><analytic><title level="a" type="main">Nanoscaled Surface Patterning of Conducting Polymers</title><author><name sortKey="Jiang, Lin" sort="Jiang, Lin" uniqKey="Jiang L" first="Lin" last="Jiang">Lin Jiang</name><affiliation wicri:level="3"><country xml:lang="fr">Allemagne</country><wicri:regionArea>Physikalisches Institut, Westfaelische Wilhelms‐Universitaet Muenster and Center for Nanotechnology (CeNTech), Muenster, 48149</wicri:regionArea><placeName><region type="land" nuts="1">Rhénanie-du-Nord-Westphalie</region><region type="district" nuts="2">District de Münster</region><settlement type="city">Münster</settlement></placeName></affiliation><affiliation wicri:level="1"><country xml:lang="fr">Singapour</country><wicri:regionArea>School of Materials Science and Engineering, Nanyang Technological University, 639798</wicri:regionArea><wicri:noRegion>639798</wicri:noRegion></affiliation></author><author><name sortKey="Wang, Xing" sort="Wang, Xing" uniqKey="Wang X" first="Xing" last="Wang">Xing Wang</name><affiliation wicri:level="3"><country xml:lang="fr">Allemagne</country><wicri:regionArea>Physikalisches Institut, Westfaelische Wilhelms‐Universitaet Muenster and Center for Nanotechnology (CeNTech), Muenster, 48149</wicri:regionArea><placeName><region type="land" nuts="1">Rhénanie-du-Nord-Westphalie</region><region type="district" nuts="2">District de Münster</region><settlement type="city">Münster</settlement></placeName></affiliation></author><author><name sortKey="Chi, Lifeng" sort="Chi, Lifeng" uniqKey="Chi L" first="Lifeng" last="Chi">Lifeng Chi</name><affiliation wicri:level="3"><country xml:lang="fr">Allemagne</country><wicri:regionArea>Physikalisches Institut, Westfaelische Wilhelms‐Universitaet Muenster and Center for Nanotechnology (CeNTech), Muenster, 48149</wicri:regionArea><placeName><region type="land" nuts="1">Rhénanie-du-Nord-Westphalie</region><region type="district" nuts="2">District de Münster</region><settlement type="city">Münster</settlement></placeName></affiliation><affiliation wicri:level="1"><country wicri:rule="url">Allemagne</country></affiliation><affiliation wicri:level="3"><country xml:lang="fr">Allemagne</country><wicri:regionArea>Correspondence address: Physikalisches Institut, Westfaelische Wilhelms‐Universitaet Muenster and Center for Nanotechnology (CeNTech), Muenster, 48149</wicri:regionArea><placeName><region type="land" nuts="1">Rhénanie-du-Nord-Westphalie</region><region type="district" nuts="2">District de Münster</region><settlement type="city">Münster</settlement></placeName></affiliation></author></analytic><monogr></monogr><series><title level="j" type="main">Small</title><title level="j" type="sub">Nanotechnology with Soft Matter</title><title level="j" type="alt">SMALL</title><idno type="ISSN">1613-6810</idno><idno type="eISSN">1613-6829</idno><imprint><biblScope unit="vol">7</biblScope><biblScope unit="issue">10</biblScope><biblScope unit="page" from="1309">1309</biblScope><biblScope unit="page" to="1321">1321</biblScope><biblScope unit="page-count">13</biblScope><publisher>WILEY‐VCH Verlag</publisher><pubPlace>Weinheim</pubPlace><date type="published" when="2011-05-23">2011-05-23</date></imprint><idno type="ISSN">1613-6810</idno></series></biblStruct></sourceDesc><seriesStmt><idno type="ISSN">1613-6810</idno></seriesStmt></fileDesc><profileDesc><textClass></textClass></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">In continuing the steady development of integrated‐circuit‐related fabrication, the ability to pattern conducting polymers into smaller and smaller sizes in order to realize devices with enhanced performance or even wholly new properties begins to take a more prominent role in their advanced applications. This review summarizes the recent advances in top‐down and bottom‐up patterning of conducting polymers on surfaces with different approaches including direct writing, in‐situ synthesis or assembly, etching, and nanoscratching. All of the latest emerging strategies have the potential to go beyond the current state of the art towards real progress in terms of high‐precision positioning, high resolution, high throughout, higher stability, facile processing, and lower‐cost production.</div><div type="abstract" xml:lang="en">Recent advances in top‐down and bottom‐up patterning of conducting polymers on surfaces using ‘add‐on’ processes such as direct writing, in‐situ syntheses or assemblies, and ‘subtract‐from’ processes such as etching and nanoscratching are summarised. These processes make possible high‐precision positioning, high resolution, and considerable throughout. The most promising applications of the patterned conducting polymer devices with enhanced performance and new properties are also introduced.</div></front></TEI><affiliations><list><country><li>Allemagne</li><li>Singapour</li></country><region><li>District de Münster</li><li>Rhénanie-du-Nord-Westphalie</li></region><settlement><li>Münster</li></settlement></list><tree><country name="Allemagne"><region name="Rhénanie-du-Nord-Westphalie"><name sortKey="Jiang, Lin" sort="Jiang, Lin" uniqKey="Jiang L" first="Lin" last="Jiang">Lin Jiang</name></region><name sortKey="Chi, Lifeng" sort="Chi, Lifeng" uniqKey="Chi L" first="Lifeng" last="Chi">Lifeng Chi</name><name sortKey="Chi, Lifeng" sort="Chi, Lifeng" uniqKey="Chi L" first="Lifeng" last="Chi">Lifeng Chi</name><name sortKey="Chi, Lifeng" sort="Chi, Lifeng" uniqKey="Chi L" first="Lifeng" last="Chi">Lifeng Chi</name><name sortKey="Wang, Xing" sort="Wang, Xing" uniqKey="Wang X" first="Xing" last="Wang">Xing Wang</name></country><country name="Singapour"><noRegion><name sortKey="Jiang, Lin" sort="Jiang, Lin" uniqKey="Jiang L" first="Lin" last="Jiang">Lin Jiang</name></noRegion></country></tree></affiliations></record>Pour manipuler ce document sous Unix (Dilib)
EXPLOR_STEP=$WICRI_ROOT/Sante/explor/MersV1/Data/Main/Exploration
HfdSelect -h $EXPLOR_STEP/biblio.hfd -nk 002539 | SxmlIndent | more
Ou
HfdSelect -h $EXPLOR_AREA/Data/Main/Exploration/biblio.hfd -nk 002539 | SxmlIndent | more
Pour mettre un lien sur cette page dans le réseau Wicri
{{Explor lien
|wiki= Sante
|area= MersV1
|flux= Main
|étape= Exploration
|type= RBID
|clé= ISTEX:CDE8BED65384518E846832DD45123D332E048E34
|texte= Nanoscaled Surface Patterning of Conducting Polymers
}}
| This area was generated with Dilib version V0.6.33. |  |